減少側蝕(shi)和突(tu)沿(yan)，提(ti)高蝕(shi)刻系數

側(ce)(ce)蝕(shi)(shi)(shi)(shi)(shi)產生突(tu)(tu)(tu)沿。通常(chang)印制(zhi)板在蝕(shi)(shi)(shi)(shi)(shi)刻(ke)液中的(de)時間(jian)越(yue)長(chang)，（或者使(shi)用(yong)老式的(de)左右搖擺蝕(shi)(shi)(shi)(shi)(shi)刻(ke)機）側(ce)(ce)蝕(shi)(shi)(shi)(shi)(shi)越(yue)嚴(yan)重(zhong)。側(ce)(ce)蝕(shi)(shi)(shi)(shi)(shi)嚴(yan)重(zhong)影響印制(zhi)導(dao)(dao)線(xian)的(de)精度，嚴(yan)重(zhong)側(ce)(ce)蝕(shi)(shi)(shi)(shi)(shi)將使(shi)制(zhi)作精細導(dao)(dao)線(xian)成(cheng)為不可能。當(dang)側(ce)(ce)蝕(shi)(shi)(shi)(shi)(shi)和突(tu)(tu)(tu)沿降低時，蝕(shi)(shi)(shi)(shi)(shi)刻(ke)系數(shu)(shu)就升(sheng)高，高的(de)蝕(shi)(shi)(shi)(shi)(shi)刻(ke)系數(shu)(shu)表示有(you)保持(chi)細導(dao)(dao)線(xian)的(de)能力，使(shi)蝕(shi)(shi)(shi)(shi)(shi)刻(ke)后的(de)導(dao)(dao)線(xian)接近原(yuan)圖尺(chi)寸。電鍍蝕(shi)(shi)(shi)(shi)(shi)刻(ke)抗蝕(shi)(shi)(shi)(shi)(shi)劑(ji)無論是錫－鉛合金，錫，錫－鎳(nie)合金或鎳(nie)，突(tu)(tu)(tu)沿過度都會造成(cheng)導(dao)(dao)線(xian)短路。因(yin)為突(tu)(tu)(tu)沿容(rong)易斷(duan)裂下來，在導(dao)(dao)線(xian)的(de)兩點(dian)之間(jian)形成(cheng)電的(de)橋接。

提(ti)高板(ban)子(zi)與板(ban)子(zi)之間蝕刻速率(lv)的一致(zhi)性

在連續的(de)板子蝕刻(ke)(ke)中，蝕刻(ke)(ke)速率(lv)越(yue)一致，越(yue)能獲得(de)均勻蝕刻(ke)(ke)的(de)板子。要達(da)到這一要求，必須保證蝕刻(ke)(ke)液(ye)(ye)在蝕刻(ke)(ke)的(de)全(quan)過程始終保持在佳(jia)的(de)蝕刻(ke)(ke)狀態。這就要求選(xuan)(xuan)擇容易再生和(he)補償(chang)，蝕刻(ke)(ke)速率(lv)容易控(kong)(kong)(kong)制的(de)蝕刻(ke)(ke)液(ye)(ye)。選(xuan)(xuan)用能提供恒定的(de)操作條件和(he)對(dui)各種溶(rong)液(ye)(ye)參數能自(zi)動控(kong)(kong)(kong)制的(de)工藝(yi)和(he)設備。通過控(kong)(kong)(kong)制溶(rong)銅量，PH值，溶(rong)液(ye)(ye)的(de)濃度(du)，溫(wen)度(du)，溶(rong)液(ye)(ye)流量的(de)均勻性(xing)(噴(pen)(pen)淋系統或噴(pen)(pen)嘴以(yi)及(ji)噴(pen)(pen)嘴的(de)擺動)等來實現。

提(ti)高整個(ge)板子表(biao)面(mian)蝕刻(ke)速率的均勻性(xing)

板(ban)(ban)(ban)子上(shang)下(xia)(xia)兩面(mian)(mian)(mian)以(yi)及板(ban)(ban)(ban)面(mian)(mian)(mian)上(shang)各個部位(wei)的(de)(de)(de)蝕刻(ke)(ke)(ke)均勻性是(shi)由板(ban)(ban)(ban)子表面(mian)(mian)(mian)受到蝕刻(ke)(ke)(ke)劑(ji)流量的(de)(de)(de)均勻性決定(ding)的(de)(de)(de)。蝕刻(ke)(ke)(ke)過程中，上(shang)下(xia)(xia)板(ban)(ban)(ban)面(mian)(mian)(mian)的(de)(de)(de)蝕刻(ke)(ke)(ke)速(su)率往往不一致。一般來說，下(xia)(xia)板(ban)(ban)(ban)面(mian)(mian)(mian)的(de)(de)(de)蝕刻(ke)(ke)(ke)速(su)率高于上(shang)板(ban)(ban)(ban)面(mian)(mian)(mian)。因為(wei)上(shang)板(ban)(ban)(ban)面(mian)(mian)(mian)有(you)溶液的(de)(de)(de)堆積(ji)，減弱了蝕刻(ke)(ke)(ke)反應的(de)(de)(de)進(jin)(jin)行(xing)。可以(yi)通(tong)過調整上(shang)下(xia)(xia)噴(pen)嘴的(de)(de)(de)噴(pen)啉壓力來解決上(shang)下(xia)(xia)板(ban)(ban)(ban)面(mian)(mian)(mian)蝕刻(ke)(ke)(ke)不均的(de)(de)(de)現象。蝕刻(ke)(ke)(ke)印制板(ban)(ban)(ban)的(de)(de)(de)一個普(pu)遍問題(ti)是(shi)在相(xiang)同時間里使全(quan)部板(ban)(ban)(ban)面(mian)(mian)(mian)都蝕刻(ke)(ke)(ke)干凈是(shi)很難(nan)做到的(de)(de)(de)，板(ban)(ban)(ban)子邊緣比(bi)板(ban)(ban)(ban)子中心(xin)部位(wei)蝕刻(ke)(ke)(ke)的(de)(de)(de)快。采用噴(pen)淋系統并使噴(pen)嘴擺動是(shi)一個有(you)效(xiao)的(de)(de)(de)措施。更進(jin)(jin)一步的(de)(de)(de)改善(shan)可以(yi)通(tong)過使板(ban)(ban)(ban)中心(xin)和板(ban)(ban)(ban)邊緣處的(de)(de)(de)噴(pen)淋壓力不同，板(ban)(ban)(ban)前沿和板(ban)(ban)(ban)后端間歇蝕刻(ke)(ke)(ke)的(de)(de)(de)辦法，達到整個板(ban)(ban)(ban)面(mian)(mian)(mian)的(de)(de)(de)蝕刻(ke)(ke)(ke)均勻性